This new features allows the user to export a sequence of programmed patterns to a gds file.  This is great for creating test masks.  Read more for demo video...

For ten years Panoramic Technology has raised the bar for accuracy, power, flexibility and overall value for advanced lithography simulation.  We're celebrating by giving a free performance upgrade for all users. Our latest release allows up to four threads to be used per simulation. Customers can pick up the build from the download area after logging in.

• Perfect for Double Patterning Simulations
• Immersion bubble, reflective notching, non-planar resist surface, underlying structures
• Calculate image-in-resist in the presence of topography rigorously with TEMPESTpr2
• Hardware Acceleration and Parallel Processing
• Powerful 3D geometry editor lets user define and visualize the wafer geometry
• See the demo video