FullChip® Lithography Engineering Software for R&D and Production

• OPC / Litho Simulation / Verification
• High Performance Pattern Matcher
• Layout Database Server / Viewer Client GUI
• Compact Resist Model (including contour-based calibration)
• 3D Mask Effects (M3D)
• Hot Spot Detection / PV-Band Analysis
• Model-based and Rules-based SRAF placement
• Retargeting, Dummy Fill, Multiple Patterning Decomposition
• Presentation and Videos

TRIG is a new fast, rigorous, accurate, 3D Maxwell solver for EUV and DUV

• Particularly fast for rigorous EUV (20X faster than FDTD+FBC)
• Faster for DUV (~2X to 5X)
• See presentation on TRIG for EUV
• See presentation on TRIG for DUV
• See detailed performance benchmark (DUV)
• See 50X speed-up for rigorous EUV video

Our upcoming version 7 ("v7") introduces a new level of performance for advanced lithography simulation

• New, fast, 3D rigorous simulator Maxwell simulator:  TRIG
• Sub-grid resolution in TEMPESTpr2
• SEM simulator:  PanSEM
• SEM image analysis:  PanSIA
• Source optimization:  PanSO
• Faster RCWA
• Faster and more robust 3D FEM modeling of resist shrinkage
• NTD resist model
• Stochastic resist models for EUV and DUV
• and much more

• Negative Tone Develop (NTD) Resist Model
• Included with Resist option
• 3D FEM modeling of deprotection shrinkage
• See video!
• See presentation!

• Simulate SEM image formation
• Physics-based model
• Including SEM-induced shrinkage
• Calibrate resist models by comparing simulated SEM CD to experimentally measured SEM CD (an "apples to apples" comparison)
• Includes PanSIA
• See video!
• See presentation!

• SEM Image Analysis
• Available as stand-alone tool and/or works with HyperLith
• Measure both simulated and real SEM images
• Allows "apples-to-apples" comparison of CD
• Generate CD and LER Bossungs (with fitting)
• Local CD uniformity (LCDU)
• See video!
• See presentation!