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  • Two Source Optimization Algorithms (SO1 & SO2)
  • Easy to use - integrated right into the GDS-Multi-site Mask Pattern
  • Rigorous mask model can be used, both EUV and DUV (EUV presentation, DUV presentation)
  • Anamorphic and asymmetric supported (for EUV)
  • Can optimize over multiple patterns simultaneously
  • See video!
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