Panoramic Technology Inc. is serious about resist modeling.  We recognize the need for researchers to be able to develop their own resist models, and calibrate these models to experimental data.  We also realize that the information involved may be confidential and that researchers may want to keep their resist modeling expertise "in-house".  And that is why we have developed our "Advanced Resist Modeling Infrastructure" or ARMI.

• Calibrate resist models with PanTune(TM)
• Write your own resist-models with our UWRM API
• Check out the Demo Videos

• Easy-to-use and Powerful
• Supports scalar and rigorous, EUV and DUV technologies
• Hardware Acceleration, Parallel Processing, Distributed Computing
• Windows & Linux 32/64 bit
• Use pre-defined mask technologies, patterns, scanner set-up, resist models or create your own
• Export .sim file for EM-Suite^TM

• Same trusted TEMPESTpr2 numerics, just 10X faster
• Distributed Computing Capable (different GPU's in different boxes working together on large TEMPESTpr2 simulation)
• NVIDIA CUDA-capable cards
• Hardware/Turnkey Systems offered directly from Panoramic Technology
• See benchmarks

Panoramic Technology has taken advantage of the incredible computing power found in today's nVidia hardware to significantly increase the performance. Depending on the hardware and simulation, performance can be 5 to 15 times faster than CPU simulations.

• Our Core Graphical User Interface
• 3D geometry editing
• full-vector aerial imaging with complete control of polarization
• powerful batching capabilities

• True Distributed Computing (one large job running across multiple machines on the network)
• Parallel Processing (batch distribution)
• Multi-core/Multi-processor/Multi-machine
• Completely cross platform (Windows/Linux 32/64-bit)
• Facilities for large clusters
• Interfaces with load-sharing software

• Several models available including:
  • Full Physics (3D acid & base diffusion, acid catalyzed deprotection, 3D develop)
  • Diffused image (aerial or image-in-resist)
  • Chemically Amplified Lumped Parameter Model (CALPM)
  • New Panoramic Resist Model (PRM) fast and ideal for EUV
• Free tuning service
• Free conversion of parameter sets from other resist simulators