Panoramic Technology Inc. is serious about resist modeling.  We recognize the need for researchers to be able to develop their own resist models, and calibrate these models to experimental data.  We also realize that the information involved may be confidential and that researchers may want to keep their resist modeling expertise "in-house".  And that is why we have developed our "Advanced Resist Modeling Infrastructure" or ARMI.

• Calibrate resist models with PanTune(TM)
• Write your own resist-models with our UWRM API
• Check out the Demo Videos

• Calibrate your resist models by finding parameters to make your simulated results match your measured results.
• Can be used to calibrate any resist model (Full Physics, Diffused-Image Model, Chemically Amplified Lumped Parameter Model, Panoramic Resist Model)
• Able to use the full power of HyperLith's rigorous mask models (mask 3D effects), and realistic scanner models in the tune
• Easily import empirical data from file or by cut & paste
• Set valid limits on both empirical and simulated data
• Works with SimRunner (ie. distributed/network computing)
• User has complete access to the results - no encrypted secret resist model parameters.
• Save money and time by calibrating your resists in-house
• Keep your resist calibration expertise in-house

User-Written Resist Models (UWRM)

• develop your own resist models in-house
• simple, yet powerful Java(tm) application programming interface (API)
• expose your "knobs" as yellow fields in the HyperLith or EM-Suite GUI
• thin or thick, aerial image or image-in-resist based models allowed
• return development time level-set function, or development rate and let HyperLith do the development for you
• many examples to work from
• high level of support (including help with coding) offered by Panoramic

ARMI Demo Video #1 - UWRM

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ARMI Demo Video #2 - PanTune (video is black for first 15 seconds)

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