Frequently Asked Questions

Who/What is Panoramic Technology Inc.?

What Products does Panoramic Technology Inc. Offer?

How does Panoramic Software differ from other commercial lithography simulation packages?

Who uses Panoramic Technology software?

What types of things can be simulated with EM-Suite?

Why does Panoramic offer OPC?  Is Panoramic moving into the EDA space?

What platforms/systems are supported?

How is the software licensed?

How much does the software cost?

Who/What is Panoramic Technology Inc.?

Panoramic Technology Inc. is a software company that offers advanced semiconductor lithography simulation software.  The company was founded in 1999 and is the leader in 3D rigorous lithography simulation.  The main product, EM-Suite is used world wide by lithographers to study various aspects of photolithography.

What Products does Panoramic Technology Inc. Offer?

The main product is called EM-Suite to which various options can be added.

How does Panoramic Software differ from other commercial lithography simulation packages?

Simply put: Panoramic Software is more flexible, more powerful, better supported and costs much less than competing packages.  Contact us and we'll prove it.

Who uses Panoramic Technology software?

Our customer base is over 100 users world-wide.  Customers include:

What types of things can be simulated with EM-Suite?

The software is very flexible and can simulate many aspects of lithography including:

Why does Panoramic offer OPC?  Is Panoramic moving into the EDA space?

Our newest product is PanOPC which allows a researcher to apply model-based optical proximity correction to a small area of a layout.  We offer two algorithms, one that allows very smooth movement of the mask features ("continuous segmentation") and another which maintains a Manhattan pattern.

The PanOPC is a useful tool for researches because at today's lithography node, it is meaningless to simulate uncorrected mask patterns.  Any measurement of process window will be completely inaccurate if based on uncorrected patterns for all but the simplest patterns.  With PanOPC, researchers can correct a critical portion of the mask (using rigorous mask model and resist simulation if required) and then get meaningful information from the subsequent analysis.

Panoramic is not attempting to move into the EDA space - i.e. full-chip correction.  This is a small-area tool to be used by researchers analyzing very small subsets of mask patterns (i.e. a bit-cell).

What platforms/systems are supported?

How is the software licensed?

How much does the software cost?

You will discover that our software is only a fraction of the cost of comparable packages.  Volume discounts are available.  Please contact us for a quote. 

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